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China's first maskless "lithography machine" was successfully developed
On December 25th, the Hefei Economic Development Zone Management Committee announced a major breakthrough in China's semiconductor industry. A domestically developed, maskless (direct write) lithography machine with world-leading performance and full intellectual property rights has been successfully created in Hefei. This achievement marks a significant milestone, as it breaks China's long-standing reliance on imported sub-micron lithography equipment, which had previously dominated the market.
Lithography machines are considered the most critical tools in chip manufacturing, responsible for etching intricate circuit patterns onto semiconductor wafers. Given that China is the world’s largest consumer of integrated circuits—accounting for over 24% of global demand—its self-sufficiency rate remains below 10%, highlighting a major gap in domestic capabilities. To address this, the development of advanced lithography technology was included in the national "Eleventh Five-Year Plan" as a key priority. The newly developed maskless lithography machine boasts a resolution of 0.65 microns, making it suitable for various industries, including semiconductors, biotechnology, medical devices, optoelectronics, solar energy, new energy technologies, and thin-film circuits.
The project was led by Core Semiconductor (China) Co., Ltd., which began its operations in Hefei in late 2006. Within just one year, the company successfully developed its first prototype. Looking ahead, the company plans to begin mass production after the completion of the first phase of the project, which is expected to be finalized in September of next year. This development not only strengthens China's position in the global semiconductor supply chain but also signals a growing trend toward technological independence and innovation in the country’s high-tech sector.